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光学薄膜界面粗糙度互相关特性与光散射

 

博信光学元件超市 / 2014-05-09

        为了研究光学薄膜界面的互相关特性及光散射特性,介绍了光学薄膜的散射理论和模型。依据光学薄膜矢量散射的表达式,借助于总背向散射理论分析了光学薄膜界面互相关特性对光散射的影响,并用实验验证和分析了TiO2单层薄膜膜层厚度,K9玻璃基底粗糙度以及离子束辅助沉积(IBAD)工艺等因素对光学薄膜界面互相关特性的影响。结果表明,根据矢量光散射理论计算的光学薄膜界面互相关特性和光散射的关系与实验测量结果一致。随着基底粗糙度、薄膜光学厚度的增加,薄膜界面的互相关特性会变差,采用离子束辅助沉积的TiO2单层薄膜的膜层界面互相关性明显好于不用离子束辅助沉积的薄膜。
         In order to study cross correlated properties and light scattering of optical thin films interfaces roughness, the theoretical models of optical thin films interfaces roughness light scattering were concisely presented. Furthermore, based on the expression of vectorial scattering of optical films, influence of interfaces roughness cross-correlated properties on light scattering was analyzed by total backscattering theory. Moreover, effects of TiO2 single optical films thickness, substrate roughness of K9 glass and ion beam assisted deposition (IBAD) technique on interface roughness cross correlated properties were studied by experiments, respectively. The results show that theoretical results obtained by integrating vector light scattering are agreement well with experimental results. With the increase of films thickness and substrates roughness, the interfaces roughness cross-correlated properties decrease. When ion beam assisted deposition is used, a high degree of cross-correlated properties can be observed.
 

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